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GRH1802 Dry Claw Vacuum Pump 1800 m³/h High-Speed Oil-Free Vacuum Pump for Semiconductor Manufacturing

GRH1802 Dry Claw Vacuum Pump 1800 m³/h High-Speed Oil-Free Vacuum Pump for Semiconductor Manufacturing

製品詳細:
起源の場所: 中国
ブランド名: Baosi
証明: CE
モデル番号: GRH1802
詳細情報
起源の場所:
中国
ブランド名:
Baosi
証明:
CE
モデル番号:
GRH1802
排気速度:
1800立方メートル/時
到達圧力:
≤0.5Pa
モーター出力:
7.5+4.5kW
電圧:
380V/三相
入口:
ISO160
出口:
KF40
ノイズ:
<70dB(A)
重さ:
472キロ
寸法:
935×420×795mm
冷却水:
0.3~0.6MPa、6L/min
N2パージ:
0.25~0.69MPa、4~96L/min
ハイライト:

High Light

ハイライト:

high speed dry vacuum pump

,

1800m3h claw vacuum pump

,

semiconductor process vacuum pump

取引情報
最小注文数量:
1セット
価格:
USD 9500-13500/Set
パッケージの詳細:
輸出標準木製ケース包装
受渡し時間:
15~30営業日
支払条件:
T/T、L/C
供給の能力:
50セット/月
商品の説明

GRH1802 Dry Claw Vacuum Pump — 1800 m³/h Oil-Free Industrial Solution

The GRH1802 is a high-performance dry claw vacuum pump from the GRH series, delivering 1800 m³/h pumping speed with ultimate pressure ≤0.5 Pa. Its oil-free claw mechanism makes it ideal for semiconductor, photovoltaic, and lithium battery manufacturing processes that demand contamination-free vacuum environments.

Key Features

  • Oil-Free Claw Mechanism: No oil or working medium in pump chamber — ensures process cleanliness
  • Permanent Magnet Synchronous Motor: Superior energy efficiency for lower operating costs
  • Advanced Rotor Design: Enhanced dust exhaust capability for harsh process conditions
  • Dust & Vapor Insensitive: Handles dust and water vapor in pumped gases reliably
  • Compact & Integrated: Space-efficient design (935 * 420 * 795 mm, 472 kg)
  • Full Protection: Comprehensive protection with strong adaptive control
  • Low Vibration & Noise: Below 70 dB(A) at ultimate pressure
  • Advanced Sealing System: Lip seal + labyrinth seal + nitrogen purge for oil-free vacuum
  • Remote Monitoring: I/O and RS485 (Modbus) interface for remote control

Technical Specifications

ModelGRH1802
Pumping Speed1800 m³/h
Ultimate Pressure≤0.5 Pa
Motor Power7.5 + 4.5 kW
Voltage380V (3-Phase)
Inlet ConnectionISO160
Outlet ConnectionKF40
Noise Level<70 dB(A)
Weight472 kg
Dimensions (L*W*H)935 * 420 * 795 mm
Cooling Water Pressure0.3–0.6 MPa
Cooling Water Flow6 L/min
N₂ Purge Pressure0.25–0.69 MPa
N₂ Purge Flow4–96 L/min
Operating Temperature5–40°C; ≤80% RH

Applications

  • Semiconductor: Etch, Ion Implantation, CVD (ALD, PECVD, MOCVD, SACVD, RTP, HDP-CVD)
  • Photovoltaic: Crystal growth furnaces, solar cell fabrication
  • Lithium Battery: Cell vacuum drying, electrolyte filling, degassing